GROWTH STUDY OF Y-BA-CU-O ON BUFFER LAYERS AND DIFFERENT SUBSTRATES MADE BY ULTRASONIC SPRAY PYROLYSIS

Abstract

Atomic Force Microscopy (AFM) was used to observe the growth stages of both buffer layers and Y-Ba-Cu-O films on three different substrates: Si (100) and MgO (100) for crystalline ones and fused silica for the amorphous type. In order to compare the benefits of buffer layers, YSZ was grown on the three different substrates and AFM topographies were made at each stage of growth: Bare substrate, YSZ films on bare substrates, Y-Ba-Cu-O/YSZ films and Y-Ba-Cu-O on bare substrates. An Ultrasonic Spray Pyrolysis system was used to deposit all the films and layers. Films grown on buffer layers present smoother surfaces than those grown on bare substrates.